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Pure tantalum metal sputtering target. Pure tantalum target, tantalum target

Pure Tantalum Round TargetApplication: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.Physical and Chemical PropertiesChemical Composition: TaDensity:   ≥99.5%Machining SizeCustomized according to customer requirements
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Pure Tantalum Round Target

Application: Mainly used for producing thin film, widely used in Decorative glass mirror film, PCB plate, TFT-LCD, Low-E glass film, semiconductor electronics.

Physical and Chemical Properties
Chemical Composition: Ta
Density:   ≥99.5%

Machining Size
Customized according to customer requirements

Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target

Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
Pure Tantalum Metal Sputtering Target. Pure Tantalum Round Target, Ta Target
 
Tantalum Carbide Tungsten Carbide Tungsten Carbide Tools Carbide Burr Grinder Cutting Disc Rock Bit Carbide Rotary Burr Circular Saw Blades Cutting Burr Diamond Saw Diamond Cut Wheels

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